隨著納米科技的迅速發展，下一代光刻技術在微細加工領域發揮著日益重要的作用。
作為復雜半導體加工主要手段之一的電子束曝光系統，需要穩定完善的控制軟件來保證其正常運行。本文介紹了電子束曝光控制系統的設計原理，并著重介紹了其對電子束曝光的全過程進行控制的強大功能。
關鍵詞：電子束曝光控制系統繪制圖形
Abstract: With the quick development of nanoscience and nanotechnology, Next Generation
Lithography has played more and more important role in the field of micro-fabrication. As one
of the complicated semiconductor machining equipments, electron beam lithography system needs steady control software system to ensure that it can run correctly. In this paper, the fundamental theories of the newly developed control system for electron beam lithography are introduced. Furthermore, the robust control of the whole process from creating exposure files until the final exposure is discussed in particular.
Key Word: Electron beam Lithography, Control system, Draw graphics